Invention Grant
- Patent Title: Resist composition, method for forming resist pattern, polyphenolic compound for use in the composition, and alcoholic compound that can be derived therefrom
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Application No.: US14238402Application Date: 2012-08-09
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Publication No.: US09598392B2Publication Date: 2017-03-21
- Inventor: Masatoshi Echigo , Masako Yamakawa
- Applicant: Masatoshi Echigo , Masako Yamakawa
- Applicant Address: JP Tokyo
- Assignee: MITSUBISHI GAS CHEMICAL COMPANY, INC.
- Current Assignee: MITSUBISHI GAS CHEMICAL COMPANY, INC.
- Current Assignee Address: JP Tokyo
- Agency: Fitch, Even, Tabin & Flannery, LLP
- Priority: JP2011-176923 20110812; JP2011-201757 20110915; JP2011-218626 20110930
- International Application: PCT/JP2012/070304 WO 20120809
- International Announcement: WO2013/024778 WO 20130221
- Main IPC: C07C37/20
- IPC: C07C37/20 ; C07C39/225 ; C07D311/78 ; C07D311/96 ; G03F7/031 ; G03F7/038 ; C07C39/14 ; C07C39/17 ; G03F7/004 ; G03F7/20 ; G03F7/32
Abstract:
A resist composition containing a compound represented by the general formula (1) or (2), a method for forming a resist pattern using the composition, a polyphenolic compound for use in the composition, and an alcoholic compound that can be derived therefrom are described.
Public/Granted literature
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