Invention Grant
- Patent Title: High purity silica sol and its production method
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Application No.: US13727791Application Date: 2012-12-27
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Publication No.: US09598611B2Publication Date: 2017-03-21
- Inventor: Kazuhiro Nakayama , Akira Nakashima , Michio Komatsu
- Applicant: JGC Catalysts and Chemicals Ltd.
- Applicant Address: JP Kawasaki-shi
- Assignee: JGC Catalysts and Chemicals Ltd.
- Current Assignee: JGC Catalysts and Chemicals Ltd.
- Current Assignee Address: JP Kawasaki-shi
- Agency: The Webb Law Firm
- Priority: JP2011-287575 20111228
- Main IPC: C01B33/141
- IPC: C01B33/141 ; C09G1/02 ; C01B33/143 ; C09K3/14

Abstract:
A method for producing a high purity silica sol is provided. This method has enabled use of water glass for the starting material, and the resulting silica sol has a reduced metal impurity Cu and Ni content compared to conventional methods. The method comprises (1) ultrafiltration of an aqueous solution of an alkali silicate; (2) ion exchange process for removal of at least a part of cationic components in the purified aqueous solution of an alkali silicate; (3) another ion exchange process using a chelating ion exchange resin to obtain high purity silicate solution; and (4) adjustment of a part of the high purity silicate solution (seed solution) to alkaline pH and mixing of this solution with another part of the solution (feed solution) to produce a high purity silica sol having a Cu concentration and a Ni concentration (in relation to the dry silica) of up to 50 ppb.
Public/Granted literature
- US20140013674A1 High Purity Silica Sol and its Production Method Public/Granted day:2014-01-16
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