Invention Grant
- Patent Title: Method of filling through-holes
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Application No.: US13829143Application Date: 2013-03-14
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Publication No.: US09598787B2Publication Date: 2017-03-21
- Inventor: Nagarajan Jayaraju , Elie H. Najjar , Leon R. Barstad
- Applicant: Rohm and Haas Electronic Materials LLC
- Applicant Address: US MA Marlborough
- Assignee: Rohm and Haas Electronic Materials LLC
- Current Assignee: Rohm and Haas Electronic Materials LLC
- Current Assignee Address: US MA Marlborough
- Agent John J. Piskorski
- Main IPC: C25D5/34
- IPC: C25D5/34 ; C25D3/38 ; C25D5/02 ; C25D5/10 ; H05K3/42 ; C23C18/16

Abstract:
The methods inhibit or reduce dimpling and voids during copper electroplating of through-holes with flash copper layers in substrates such as printed circuit boards. An acid solution containing reaction products of aromatic heterocyclic nitrogen compounds and epoxy-containing compounds is applied to the through-holes of the substrate followed by filling the through-holes with copper using a copper electroplating bath which includes additives such as brighteners and levelers.
Public/Granted literature
- US20140262799A1 METHOD OF FILLING THROUGH-HOLES Public/Granted day:2014-09-18
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