Invention Grant
- Patent Title: Methods and apparatus for an ISFET
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Application No.: US14478149Application Date: 2014-09-05
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Publication No.: US09599587B2Publication Date: 2017-03-21
- Inventor: Patrice M. Parris , Weize Chen , Richard J. De Souza , Md M. Hoque , John M. McKenna
- Applicant: Patrice M. Parris , Weize Chen , Richard J. De Souza , Md M. Hoque , John M. McKenna
- Applicant Address: US TX Austin
- Assignee: NXP USA, INC.
- Current Assignee: NXP USA, INC.
- Current Assignee Address: US TX Austin
- Main IPC: G11C16/04
- IPC: G11C16/04 ; G01N27/414 ; H01L27/115 ; H01L49/02 ; H01L29/66 ; H01L29/788 ; H01L29/94 ; G05F1/575 ; H01L21/28 ; H01L23/522

Abstract:
An ISFET includes a control gate coupled to a floating gate in a CMOS device. The control gate, for example, a poly-to-well capacitor, is configured to receive a bias voltage and effect movement of a trapped charge between the control gate and the floating gate. The threshold voltage of the ISFET can therefore by trimmed to a predetermined value, thereby storing the trim information (the amount of trapped charge in the floating gate) within the ISFET itself.
Public/Granted literature
- US20140375370A1 METHODS AND APPARATUS FOR AN ISFET Public/Granted day:2014-12-25
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