Invention Grant
- Patent Title: Vertical hall element
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Application No.: US14943493Application Date: 2015-11-17
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Publication No.: US09599682B2Publication Date: 2017-03-21
- Inventor: Satoshi Suzuki , Mika Ebihara , Takaaki Hioka
- Applicant: SEIKO INSTRUMENTS INC.
- Applicant Address: JP
- Assignee: SII Semiconductor Corporation
- Current Assignee: SII Semiconductor Corporation
- Current Assignee Address: JP
- Agency: Adams & Wilks
- Priority: JP2014-239333 20141126; JP2015-191873 20150929
- Main IPC: G01R33/07
- IPC: G01R33/07 ; H01L43/14 ; H01L43/06 ; H01L43/12

Abstract:
Provided is a highly sensitive vertical Hall element without increasing a chip area. In the vertical Hall element, trenches each filled with an insulating film are formed between a first current supply end and voltage output ends, respectively, which enables the restriction of current flow into the voltage output ends to increase the ratio of a current component perpendicular to a substrate surface, resulting in enhanced sensitivity.
Public/Granted literature
- US20160146906A1 VERTICAL HALL ELEMENT Public/Granted day:2016-05-26
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