- Patent Title: Methods for working and sensing synthetic quartz glass substrate
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Application No.: US14645908Application Date: 2015-03-12
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Publication No.: US09599746B2Publication Date: 2017-03-21
- Inventor: Shuhei Ueda , Masaki Takeuchi
- Applicant: SHIN-ETSU CHEMICAL CO., LTD.
- Applicant Address: JP Tokyo
- Assignee: SHIN-ETSU CHEMICAL CO., LTD.
- Current Assignee: SHIN-ETSU CHEMICAL CO., LTD.
- Current Assignee Address: JP Tokyo
- Agency: Westerman, Hattori, Daniels & Adrian, LLP
- Priority: JP2014-053468 20140317
- Main IPC: C03C15/00
- IPC: C03C15/00 ; G01V8/12 ; C23C16/02 ; C03C17/09 ; C03C23/00 ; B24B37/04 ; B24B49/12
Abstract:
A synthetic quartz glass substrate having front and back surfaces is worked by lapping, etching, mirror polishing, and cleaning steps for thereby polishing the front surface of the substrate to a mirror-like surface. The etching step is carried out using a hydrofluoric acid solution at pH 4-7.
Public/Granted literature
- US20150260877A1 METHODS FOR WORKING AND SENSING SYNTHETIC QUARTZ GLASS SUBSTRATE Public/Granted day:2015-09-17
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