Invention Grant
- Patent Title: Method for manufacturing support frame for pellicle, support frame for pellicle, and pellicle
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Application No.: US14415416Application Date: 2013-07-11
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Publication No.: US09599889B2Publication Date: 2017-03-21
- Inventor: Takayuki Yamaguchi , Yoshihiro Taguchi , Akira Iizuka
- Applicant: NIPPON LIGHT METAL COMPANY, LTD.
- Applicant Address: JP Tokyo
- Assignee: NIPPON LIGHT METAL COMPANY, LTD.
- Current Assignee: NIPPON LIGHT METAL COMPANY, LTD.
- Current Assignee Address: JP Tokyo
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: JP2012-158731 20120717; JP2012-158732 20120717; JP2012-158733 20120717
- International Application: PCT/JP2013/068979 WO 20130711
- International Announcement: WO2014/013931 WO 20140123
- Main IPC: G03F1/64
- IPC: G03F1/64 ; C25D11/16

Abstract:
Provided are a method of manufacturing a support frame for a pellicle, capable of forming a sufficiently blackened anodic oxide film through anodic oxidation treatment and providing a support frame for a pellicle industrially inexpensively with ease, a support frame for a pellicle obtained by the method, and a pellicle. Specifically, provided are a method of manufacturing a support frame for a pellicle to be used as a pellicle including an optical thin film, the method including: annealing an aluminum material formed of an Al—Zn—Mg based aluminum alloy; and subjecting the aluminum material to anodic oxidation treatment in an alkaline solution to form an anodic oxide film having a lightness index L* value of 40 or less, a support frame for a pellicle obtained by the method, and a pellicle including the support frame for a pellicle and an optical thin film.
Public/Granted literature
- US20150205195A1 METHOD FOR MANUFACTURING SUPPORT FRAME FOR PELLICLE, SUPPORT FRAME FOR PELLICLE, AND PELLICLE Public/Granted day:2015-07-23
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