Invention Grant
- Patent Title: Method for manufacturing a nanolithography mask
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Application No.: US14654277Application Date: 2013-12-16
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Publication No.: US09599890B2Publication Date: 2017-03-21
- Inventor: Christophe Navarro , Maxime Argoud , Xavier Chevalier , Raluca Tiron , Ahmed Gharbi
- Applicant: ARKEMA FRANCE , COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES
- Applicant Address: FR Colombes FR Paris
- Assignee: ARKEMA FRANCE,COMMISSARIAT A L' ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES
- Current Assignee: ARKEMA FRANCE,COMMISSARIAT A L' ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES
- Current Assignee Address: FR Colombes FR Paris
- Agency: RatnerPrestia
- Priority: FR1262610 20121221
- International Application: PCT/FR2013/053102 WO 20131216
- International Announcement: WO2014/096662 WO 20140626
- Main IPC: G03F7/004
- IPC: G03F7/004 ; G03F1/76 ; G03F1/00 ; B82Y30/00 ; H01L21/027 ; C08L53/00 ; G03F7/00 ; G03F7/32
Abstract:
The invention concerns a manufacturing method for nanolithography masks from a PS-b-PMMA block copolymer film deposited on a surface to be etched, said copolymer film comprising PMMA nanodomains orientated perpendicularly to the surface to be etched, said method being characterized in that it comprises the following steps: partially irradiating said copolymer film to form a first irradiated area and a second non-irradiated area in said copolymer film, then treating said copolymer film in a developer solvent to selectively remove at least said PMMA nanodomains of said first irradiated area of said copolymer film.
Public/Granted literature
- US20150331313A1 METHOD FOR MANUFACTURING A NANOLITHOGRAPHY MASK Public/Granted day:2015-11-19
Information query
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