Invention Grant
- Patent Title: Salt, resin, resist composition and method for producing resist pattern
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Application No.: US14835470Application Date: 2015-08-25
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Publication No.: US09599897B2Publication Date: 2017-03-21
- Inventor: Takashi Nishimura , Yuko Mukai , Koji Ichikawa
- Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
- Applicant Address: JP Tokyo
- Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
- Current Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
- Current Assignee Address: JP Tokyo
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: JP2014-170761 20140825
- Main IPC: G03F7/004
- IPC: G03F7/004 ; G03F7/20 ; G03F7/30 ; G03F7/32 ; G03F7/16 ; G03F7/38 ; G03F7/039 ; C08F220/18 ; C08F12/22 ; C08F12/26 ; C08F12/30 ; C08F12/14 ; C08F12/20 ; C07C311/48 ; C07C381/12

Abstract:
A salt represented by the formula (I); wherein Q1 and Q2 each independently represent a fluorine atom or a C1 to C6 perfluoroalkyl group, Lb1 represents a single bond or a divalent C1 to C24 saturated hydrocarbon group where a methylene group may be replaced by an oxygen atom or a carbonyl group and where a hydrogen atom may be replaced by a hydroxyl group or a fluorine atom, and Y represents a hydrogen atom, a fluorine atom, or an optionally substituted C3 to C18 alicyclic hydrocarbon group where a methylene group may be replaced by an oxygen atom, a carbonyl group or a sulfonyl group; and Ar represents a divalent C6 to C20 aromatic hydrocarbon group, and Z+ represents an organic sulfonium cation or an organic iodonium cation.
Public/Granted literature
- US20160052877A1 SALT, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN Public/Granted day:2016-02-25
Information query
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