Invention Grant
- Patent Title: Electrostatic chuck cleaner, cleaning method, and exposure apparatus
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Application No.: US14466250Application Date: 2014-08-22
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Publication No.: US09599909B2Publication Date: 2017-03-21
- Inventor: Takashi Kamo , Yoshihito Kobayashi
- Applicant: KABUSHIKI KAISHA TOSHIBA
- Applicant Address: JP Tokyo
- Assignee: Kabushiki Kaisha Toshiba
- Current Assignee: Kabushiki Kaisha Toshiba
- Current Assignee Address: JP Tokyo
- Agency: Finnegan, Henderson, Farabrow, Garrett & Dunner LLP
- Priority: JP2014-050861 20140313
- Main IPC: G03F7/20
- IPC: G03F7/20

Abstract:
According to one embodiment, an electrostatic chuck cleaner cleaning an adsorption face of an electrostatic chuck capable of attracting a reticle, and the cleaner includes: a plurality of substrates; adhesive layers provided on a major surface of each of the substrates, the adhesive layers being pressed against the adsorption face; and conductive layers provided on the major surface of each of the substrates, and the conductive layers being provided in a region other than a region where the adhesive layer being provided. The adhesive layers provided on the major surface of each of the substrates are disposed in different regions, and the entire adsorption face is pressed by the adhesive layers when the adhesive layers of the substrates are pressed against the adsorption face.
Public/Granted literature
- US20150261104A1 ELECTROSTATIC CHUCK CLEANER, CLEANING METHOD, AND EXPOSURE APPARATUS Public/Granted day:2015-09-17
Information query
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