A sample micromotion mechanism adapted to minimize an influence of a disturbance and adjust a sample drift rapidly and with high accuracy, and designed so as to be a compact, easy-to-place sample micromotion mechanism of a side-entry type that suppresses the occurrence of the sample drift and generates/displays high-resolution monitoring images and precisely drawn patterns. A charged particle device employing the sample micromotion mechanism operates followed by deformation which causes a strain. A strain measuring unit measures such strain. The sample micromotion mechanism imparts micromotion so as to reduce the strain in accordance with the measured strain value, thereby reducing deformation of the sample micromotion mechanism.