Invention Grant
- Patent Title: Bipolar junction transistor with improved avalanche capability
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Application No.: US13438902Application Date: 2012-04-04
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Publication No.: US09601605B2Publication Date: 2017-03-21
- Inventor: Qingchun Zhang , Anant K. Agarwal , Lin Cheng
- Applicant: Qingchun Zhang , Anant K. Agarwal , Lin Cheng
- Applicant Address: US NC Durham
- Assignee: Cree, Inc.
- Current Assignee: Cree, Inc.
- Current Assignee Address: US NC Durham
- Agent Anthony J. Josephson
- Main IPC: H01L29/73
- IPC: H01L29/73 ; H01L29/06 ; H01L29/74 ; H01L29/16

Abstract:
A bipolar junction transistor (BJT), which includes a collector layer, a base layer on the collector layer, an emitter layer on the base layer, and a recess region embedded in the collector layer, is disclosed. A base-collector plane is between the base layer and the collector layer. The recess region is may be below the base-collector plane. Further, the recess region and the base layer are a first type of semiconductor material. By embedding the recess region in the collector layer, the recess region and the collector layer form a first P-N junction, which may provide a point of avalanche for the BJT. Further, the collector layer and the base layer form a second P-N junction. By separating the point of avalanche from the second P-N junction, the BJT may avalanche robustly, thereby reducing the likelihood of avalanche induced failures, particularly in silicon carbide (SiC) BJTs.
Public/Granted literature
- US20130264581A1 BIPOLAR JUNCTION TRANSISTOR WITH IMPROVED AVALANCHE CAPABILITY Public/Granted day:2013-10-10
Information query
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