Invention Grant
- Patent Title: Composite semiconductor device with different channel widths
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Application No.: US14669415Application Date: 2015-03-26
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Publication No.: US09601614B2Publication Date: 2017-03-21
- Inventor: Won Gi Min , Pete Rodriquez , Hongning Yang , Jiang-Kai Zuo
- Applicant: Won Gi Min , Pete Rodriquez , Hongning Yang , Jiang-Kai Zuo
- Applicant Address: US TX Austin
- Assignee: NXP USA, INC.
- Current Assignee: NXP USA, INC.
- Current Assignee Address: US TX Austin
- Main IPC: H01L29/78
- IPC: H01L29/78 ; H01L27/02 ; H01L29/08 ; H01L29/66 ; H01L29/06 ; H01L29/10

Abstract:
A device includes a semiconductor substrate, a first constituent transistor including a first plurality of transistor structures in the semiconductor substrate connected in parallel with one another, and a second constituent transistor including a second plurality of transistor structures in the semiconductor substrate connected in parallel with one another. The first and second constituent transistors are disposed laterally adjacent to one another and connected in parallel with one another. Each transistor structure of the first plurality of transistor structures has a lower resistance in a saturation region of operation than each transistor structure of the second plurality of transistor structures.
Public/Granted literature
- US20160284841A1 Composite Semiconductor Device with Different Channel Widths Public/Granted day:2016-09-29
Information query
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