Invention Grant
- Patent Title: Semiconductor apparatus and method for fabricating the same
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Application No.: US14600944Application Date: 2015-01-20
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Publication No.: US09601691B2Publication Date: 2017-03-21
- Inventor: Hae Chan Park
- Applicant: SK hynix Inc.
- Applicant Address: KR Gyeonggi-do
- Assignee: SK Hynix Inc.
- Current Assignee: SK Hynix Inc.
- Current Assignee Address: KR Gyeonggi-do
- Agency: IP & T Group LLP
- Priority: KR10-2014-0077504 20140624
- Main IPC: H01L45/00
- IPC: H01L45/00 ; H01L27/24
Abstract:
A semiconductor apparatus includes a variable resistor including a variable resistance layer, which is formed to surround on an inner surface of a resistive region, and an insert layer which is formed in the variable resistance layer and has a resistivity being different from that of the variable resistance layer.
Public/Granted literature
- US20150372059A1 SEMICONDUCTOR APPARATUS AND METHOD FOR FABRICATING THE SAME Public/Granted day:2015-12-24
Information query
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