Invention Grant
- Patent Title: Barrier film, organic el device, flexible substrate, and method for manufacturing barrier film
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Application No.: US14768858Application Date: 2014-05-23
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Publication No.: US09601718B2Publication Date: 2017-03-21
- Inventor: Yuka Isaji
- Applicant: PANASONIC CORPORATION
- Applicant Address: JP Osaka
- Assignee: PANASONIC CORPORATION
- Current Assignee: PANASONIC CORPORATION
- Current Assignee Address: JP Osaka
- Agency: Greenblum & Bernstein, P.L.C.
- Priority: JP2013-109726 20130524; JP2014-059002 20140320
- International Application: PCT/JP2014/002723 WO 20140523
- International Announcement: WO2014/188731 WO 20141127
- Main IPC: H01L51/52
- IPC: H01L51/52 ; C23C16/34 ; H01L51/00 ; H01L27/32
Abstract:
A barrier film that contains primarily silicon nitride has a total hydrogen concentration of 3×1022 atoms/cm3 or higher and a silicon-bonded hydrogen concentration proportion of 40% or higher, the total hydrogen concentration indicating a total of a concentration of hydrogen bonded to silicon and a concentration of hydrogen bonded to nitrogen, and the silicon-bonded hydrogen concentration proportion indicating a proportion of the concentration of hydrogen bonded to silicon to the total hydrogen concentration.
Public/Granted literature
- US20160013445A1 BARRIER FILM, ORGANIC EL DEVICE, FLEXIBLE SUBSTRATE, AND METHOD FOR MANUFACTURING BARRIER FILM Public/Granted day:2016-01-14
Information query
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