Invention Grant
- Patent Title: Innovative top-coat approach for advanced device on-wafer particle performance
-
Application No.: US13759525Application Date: 2013-02-05
-
Publication No.: US09604249B2Publication Date: 2017-03-28
- Inventor: Jennifer Y. Sun , Biraja P. Kanungo , Dmitry Lubomirsky , Vahid Fioruzdor
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Lowenstein Sandler LLP
- Main IPC: B05D3/14
- IPC: B05D3/14 ; H01L21/67 ; H01J37/32 ; C23C18/12
Abstract:
To manufacture a coating for an article for a semiconductor processing chamber, the coating is applied to the article by a method including applying a sol-gel coating of Y2O3 over the article, and curing the sol-gel coating on the article by heating the article with the sol-gel coating and exposing the article with the sol-gel coating to plasma in a semiconductor manufacturing chamber.
Public/Granted literature
- US20140030533A1 INNOVATIVE TOP-COAT APPROACH FOR ADVANCED DEVICE ON-WAFER PARTICLE PERFORMANCE Public/Granted day:2014-01-30
Information query
