Invention Grant
- Patent Title: Low refractive index film-forming composition and method of forming low refractive index film using the same
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Application No.: US13909498Application Date: 2013-06-04
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Publication No.: US09605159B2Publication Date: 2017-03-28
- Inventor: Satoko Higano , Kazuhiko Yamasaki
- Applicant: MITSUBISHI MATERIALS CORPORATION
- Applicant Address: JP Tokyo
- Assignee: MITSUBISHI MATERIALS CORPORATION
- Current Assignee: MITSUBISHI MATERIALS CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Locke Lord LLP
- Priority: JP2012-128553 20120606
- Main IPC: C04B41/49
- IPC: C04B41/49 ; C09D5/00 ; C09D1/00 ; C09D7/12 ; C08K3/36

Abstract:
A low refractive index film-forming composition and a low refractive index film are prepared with a method in which fluoroalkyl group-containing silicon alkoxide (B) is mixed with silicon alkoxide (A) to obtain a mixture; water (C), formic acid (D), and an organic solvent (E) are mixed with the mixture to produce a hydrolysate of the mixture; and silica sol (F) obtained by dispersing beaded colloidal silica particles in a liquid medium is mixed with the hydrolysate.
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