Invention Grant
- Patent Title: Mask, method for manufacturing the same and process device
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Application No.: US14515434Application Date: 2014-10-15
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Publication No.: US09605336B2Publication Date: 2017-03-28
- Inventor: Zhiyong Xiong , Dong Qian , Yunyan Wei
- Applicant: Shanghai Tianma AM-OLED Co., Ltd. , Tianma Micro-Electronics Co., Ltd.
- Applicant Address: CN Shanghai CN Shenzhen
- Assignee: SHANGHAI TIANMA AM-OLED CO., LTD.,TIANMA MICRO-ELECTRONICS CO., LTD.
- Current Assignee: SHANGHAI TIANMA AM-OLED CO., LTD.,TIANMA MICRO-ELECTRONICS CO., LTD.
- Current Assignee Address: CN Shanghai CN Shenzhen
- Agency: Alston & Bird LLP
- Priority: CN201410307668 20140630
- Main IPC: H01L21/18
- IPC: H01L21/18 ; H01L21/34 ; H01L21/027 ; C23C14/04

Abstract:
A mask and a method of making the mask are disclosed. The mask includes a transition region including at least one first region having a first thickness, and an active region having another thickness, where the thickness of the active region is greater than the first thickness. The method of making the mask includes forming a plurality of patterns in a mask body, the patterns being formed in regions of the mask body corresponding with the active region and the transition region of the mask.
Public/Granted literature
- US20150376765A1 MASK, METHOD FOR MANUFACTURING THE SAME AND PROCESS DEVICE Public/Granted day:2015-12-31
Information query
IPC分类: