Invention Grant
- Patent Title: Reflective mirror, projection optical system, exposure apparatus, and device manufacturing method
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Application No.: US14402666Application Date: 2013-03-15
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Publication No.: US09606447B2Publication Date: 2017-03-28
- Inventor: Yoshio Kawabe , Hiroshi Chiba
- Applicant: Nikon Corporation
- Applicant Address: JP Tokyo
- Assignee: Nikon Corporation
- Current Assignee: Nikon Corporation
- Current Assignee Address: JP Tokyo
- Agency: Klarquist Sparkman, LLP
- Priority: JP2012-115533 20120521
- International Application: PCT/JP2013/057471 WO 20130315
- International Announcement: WO2013/175835 WO 20131128
- Main IPC: G03F7/20
- IPC: G03F7/20 ; G02B5/08 ; G21K1/06
Abstract:
A reflective mirror is provided with a base and a multilayer film including first layers and second layers laminated alternately on the base and capable of reflecting at least a portion of the incident light. The multilayer film is provided with a first portion having a first thickness, and with a second portion which has a second thickness different from the first thickness and which is provided at a position rotationally symmetric to that of the first portion about the optical axis of the reflective mirror relative.
Public/Granted literature
- US20150219997A1 REFLECTOR, PROJECTION OPTICAL SYSTEM, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD Public/Granted day:2015-08-06
Information query
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