There is provided a scan and step exposure system to enable to perform the exposure on a large-sized subject to be exposed such as a film and a wafer, which was difficult to perform circuit patterning process on at one time, by transferring an exposure module by step feed way or making it moved continuously like scanning way in such way that an exposure subject is adsorbed on a chuck tray drawn out of the system body and the chuck tray is put into the body and placed under a mask holder, and a glass base having a film mask having circuit patterns adsorbed thereon is mounted on the mask holder, and the distance between the glass base and the exposure subject is controlled while moving the mask holder up and down, and the exposure process is performed while moving the exposure module located above the mask holder in the transverse direction continuously by scan way or by step feed way.