Invention Grant
- Patent Title: Magnetic field generation apparatus and sputtering apparatus
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Application No.: US14319638Application Date: 2014-06-30
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Publication No.: US09607813B2Publication Date: 2017-03-28
- Inventor: Jun Sasaki , Atsuhiro Abe , Ryoichi Hiratsuka
- Applicant: Sony Corporation
- Applicant Address: JP Tokyo
- Assignee: SONY CORPORATION
- Current Assignee: SONY CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Dentons US LLP
- Priority: JP2013-145204 20130711
- Main IPC: H01J37/34
- IPC: H01J37/34 ; C23C14/35 ; H01F7/02

Abstract:
Provided is a magnetic field generation apparatus including: two or more main magnetic pole portions configured to generate a main magnetic field; one or more secondary magnetic pole portions including a plurality of first divisional magnets obtained by a division, that generate a secondary magnetic field for adjusting the generated main magnetic field; and a yoke portion including one or more first yokes opposing the plurality of first divisional magnets in correspondence with the one or more secondary magnetic pole portions.
Public/Granted literature
- US20150014158A1 MAGNETIC FIELD GENERATION APPARATUS AND SPUTTERING APPARATUS Public/Granted day:2015-01-15
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