Invention Grant
- Patent Title: Dual medium filter for ion and particle filtering during semiconductor processing
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Application No.: US13479087Application Date: 2012-05-23
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Publication No.: US09607864B2Publication Date: 2017-03-28
- Inventor: John H. Zhang , Laertis Economikos , Wei-Tsu Tseng , Adam Ticknor
- Applicant: John H. Zhang , Laertis Economikos , Wei-Tsu Tseng , Adam Ticknor
- Applicant Address: US TX Coppell US NY Armonk
- Assignee: STMicroelectronics, Inc.,INTERNATIONAL BUSINESS MACHINES CORPORATION
- Current Assignee: STMicroelectronics, Inc.,INTERNATIONAL BUSINESS MACHINES CORPORATION
- Current Assignee Address: US TX Coppell US NY Armonk
- Agency: Seed Intellectual Property Law Group LLP
- Main IPC: H01L21/02
- IPC: H01L21/02 ; H01L21/67 ; B01D24/00 ; B01D53/82
Abstract:
The present disclosure is directed to fluid filtering systems and methods for use during semiconductor processing. One or more embodiments are directed to fluid filtering systems and methods for filtering ions and particles from a fluid as the fluid is being provided to a semiconductor wafer processing tool, such as to a semiconductor wafer cleaning tool.
Public/Granted literature
- US20130312791A1 DUAL MEDIUM FILTER FOR ION AND PARTICLE FILTERING DURING SEMICONDUCTOR PROCESSING Public/Granted day:2013-11-28
Information query
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