Invention Grant
- Patent Title: Common drain semiconductor device structure and method
-
Application No.: US14518906Application Date: 2014-10-20
-
Publication No.: US09607984B2Publication Date: 2017-03-28
- Inventor: Kazumasa Takenaka , Hidehito Koseki
- Applicant: Semiconductor Components Industries, LLC
- Applicant Address: US AZ Phoenix
- Assignee: SEMICONDUCTOR COMPONENTS INDUSTRIES, LLC
- Current Assignee: SEMICONDUCTOR COMPONENTS INDUSTRIES, LLC
- Current Assignee Address: US AZ Phoenix
- Agency: The Noblitt Group, PLLC
- Main IPC: H01L27/088
- IPC: H01L27/088 ; H01L29/423 ; H01L23/31 ; H01L23/00 ; H01L29/417 ; H01L23/482 ; H01L23/60 ; H01L27/02 ; H01L21/8234 ; H01L27/06

Abstract:
In one embodiment, a common drain semiconductor device includes a substrate, having two transistors integrated therein. The substrate also includes a plurality of active regions on a major surface of the substrate. The active regions of each transistor may be interleaved.
Public/Granted literature
- US20160035721A1 Common Drain Semiconductor Device Structure and Method Public/Granted day:2016-02-04
Information query
IPC分类: