Invention Grant
- Patent Title: Method of separating a wafer of semiconductor devices
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Application No.: US14399323Application Date: 2013-05-08
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Publication No.: US09608016B2Publication Date: 2017-03-28
- Inventor: Jipu Lei , Alexander H. Nickel , Stefano Schiaffino , Grigoriy Basin
- Applicant: KONINKLIJKE PHILIPS N.V.
- Applicant Address: NL Eindhoven
- Assignee: Koninklijke Philips N.V.
- Current Assignee: Koninklijke Philips N.V.
- Current Assignee Address: NL Eindhoven
- International Application: PCT/IB2013/053719 WO 20130508
- International Announcement: WO2013/171632 WO 20131121
- Main IPC: H01L33/38
- IPC: H01L33/38 ; H01L21/441 ; H01L21/782 ; H01L21/3205 ; H01L27/12 ; H01L21/02 ; H01L21/027 ; H01L21/78 ; H01L21/445 ; H01L33/00

Abstract:
A method according to embodiments of the invention includes providing a wafer comprising a semiconductor structure grown on a growth substrate. The semiconductor structure includes a light emitting layer disposed between an n-type region and a p-type region. The wafer includes trenches defining individual semiconductor devices. The trenches extend through an entire thickness of the semiconductor structure to reveal the growth substrate. The method further includes forming a thick conductive layer on the semiconductor structure. The thick conductive layer is configured to support the semiconductor structure when the growth substrate is removed. The method further includes removing the growth substrate.
Public/Granted literature
- US20150140711A1 METHOD OF SEPARATING A WAFER OF SEMICONDUCTOR DEVICES Public/Granted day:2015-05-21
Information query
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