Invention Grant
- Patent Title: Substrate for superconductor thin film, superconductor thin film, and method for producing substrate for superconductor thin film
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Application No.: US13814595Application Date: 2012-07-02
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Publication No.: US09608191B2Publication Date: 2017-03-28
- Inventor: Masaru Higuchi , Hisaki Sakamoto , Yoshinori Nagasu
- Applicant: Masaru Higuchi , Hisaki Sakamoto , Yoshinori Nagasu
- Applicant Address: JP Tokyo
- Assignee: FURUKAWA ELECTRIC CO., LTD.
- Current Assignee: FURUKAWA ELECTRIC CO., LTD.
- Current Assignee Address: JP Tokyo
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2011-146162 20110630
- International Application: PCT/JP2012/066904 WO 20120702
- International Announcement: WO2013/002410 WO 20130103
- Main IPC: H01L39/08
- IPC: H01L39/08 ; H01L39/02 ; H01L39/24 ; H01B12/06
Abstract:
A superconducting thin film having excellent critical current characteristics is provided. A substrate for a superconducting thin film includes a substrate body (10A) having a main surface (10B) in which the root mean square slope RΔq of a roughness curve is 0.4 or less.
Public/Granted literature
Information query
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