Invention Grant
- Patent Title: Gas barrier film and electronic device
-
Application No.: US14177143Application Date: 2014-02-10
-
Publication No.: US09610753B2Publication Date: 2017-04-04
- Inventor: Sinichi Hoshi , Shigeto Okuji
- Applicant: Sinichi Hoshi , Shigeto Okuji
- Applicant Address: JP Tokyo
- Assignee: Lintec Corporation
- Current Assignee: Lintec Corporation
- Current Assignee Address: JP Tokyo
- Agent Christopher Casieri
- Priority: JP2009-083871 20090331
- Main IPC: B32B27/06
- IPC: B32B27/06 ; B32B33/00 ; H01L31/048 ; C08J7/04 ; C23C14/02 ; C23C14/34 ; C23C14/06 ; C23C14/08 ; H01L31/049

Abstract:
Disclosed is a gas barrier film, which demonstrates superior gas barrier properties and surface flatness, demonstrates a high degree of adhesion between layers and is resistant to cracking when bent, and an electronic device provided therewith. A gas barrier film (10) of the present invention has a base (11), and a polyorganosiloxane layer (12) and an inorganic material layer (13) sequentially provided on at least one side of the base (11), and the inorganic material layer (13) is deposited by dynamic ion mixing method.
Public/Granted literature
- US20140150864A1 Gas Barrier Film and Electronic Device Public/Granted day:2014-06-05
Information query