Invention Grant
- Patent Title: Through-wafer interconnects for MEMS double-sided fabrication process (TWIDS)
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Application No.: US14881058Application Date: 2015-10-12
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Publication No.: US09611138B2Publication Date: 2017-04-04
- Inventor: Andrei A. Shkel , Alexandra Efimovskaya
- Applicant: The Regents of the University of California
- Applicant Address: US CA Oakland
- Assignee: The Regents of the University of California
- Current Assignee: The Regents of the University of California
- Current Assignee Address: US CA Oakland
- Agent Marcus C. Dawes; Daniel L. Dawes
- Main IPC: H01L21/768
- IPC: H01L21/768 ; B81B7/00 ; H01L21/02

Abstract:
A high-aspect ratio low resistance through-wafer interconnect for double-sided (TWIDS) fabrication of microelectromechanical systems (MEMS) serves as an interconnection method and structure for co-integration of MEMS and integrated circuits or other microcomponent utilizing both sides of the wafer. TWIDS applied to a three dimensional folded TIMU (timing inertial measurement unit) provides a path for electrical signals from sensors on the front side of the SOI wafer to electronic components on the back side of the wafer, while enabling folding of an array of sensors in a three dimensional shape.
Public/Granted literature
- US20160167958A1 THROUGH-WAFER INTERCONNECTS FOR MEMS DOUBLE-SIDED FABRICATION PROCESS (TWIDS) Public/Granted day:2016-06-16
Information query
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