Invention Grant
- Patent Title: Doped ultra-low expansion glass and methods for making the same
-
Application No.: US14958024Application Date: 2015-12-03
-
Publication No.: US09611169B2Publication Date: 2017-04-04
- Inventor: Sezhian Annamalai , Carlos Alberto Duran , Kenneth Edward Hrdina
- Applicant: Corning Incorporated
- Applicant Address: US NY Corning
- Assignee: Corning Incorporated
- Current Assignee: Corning Incorporated
- Current Assignee Address: US NY Corning
- Agent Robert L. Carlson
- Main IPC: C03C3/06
- IPC: C03C3/06 ; C03B19/14 ; C03B25/02 ; C03C3/112 ; C03C4/00

Abstract:
A doped silica-titania glass article is provided that includes a glass article having a glass composition comprising (i) a silica-titania base glass, (ii) a fluorine dopant, and (iii) a second dopant. The fluorine dopant has a concentration of fluorine of up to 5 wt. % and the second dopant comprises one or more oxides selected from the group consisting of Al, Nb, Ta, B, Na, K, Mg, Ca and Li oxides at a total oxide concentration from 50 ppm to 6 wt. %. Further, the glass article has an expansivity slope of less than 0.5 ppb/K2 at 20° C. The second dopant can be optional. The composition of the glass article may also contain an OH concentration of less than 100 ppm.
Public/Granted literature
- US20160168010A1 DOPED ULTRA-LOW EXPANSION GLASS AND METHODS FOR MAKING THE SAME Public/Granted day:2016-06-16
Information query