Invention Grant
- Patent Title: ZnO film production system and production method using ZnO film production system having heating units and control device
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Application No.: US14417196Application Date: 2013-06-19
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Publication No.: US09611545B2Publication Date: 2017-04-04
- Inventor: Song yun Kang , Yoshinao Kumagai , Akinori Koukitu
- Applicant: TOKYO ELECTRON LIMITED , NATIONAL UNIVERSITY CORPORATION TOKYO UNIVERSITY OF AGRICULTURE AND TECHNOLOGY
- Applicant Address: JP Tokyo
- Assignee: TOKYO ELECTRON LIMITED
- Current Assignee: TOKYO ELECTRON LIMITED
- Current Assignee Address: JP Tokyo
- Agency: Nath, Goldberg & Meyer
- Agent Jerald L. Meyer
- Priority: JP2012-167481 20120727
- International Application: PCT/JP2013/066863 WO 20130619
- International Announcement: WO2014/017229 WO 20140130
- Main IPC: C23C16/40
- IPC: C23C16/40 ; B05C19/06 ; C23C16/448 ; H01L21/02 ; C23C16/52
Abstract:
A ZnO film production method includes: disposing a substrate on an installation base; and, while supplying chlorine gas from a chlorine gas supply source to a first raw material storing part R1 and supplying oxygen gas from a third gas supply source (oxygen gas supply source) G3 into a reaction container, controlling heating units (heaters H1, H2 and H3) with a control device CONT such that temperature T1 of the first raw material storing part R1, temperature T2 of a second raw material storing part R2 and temperature T3 of the installation base on which the substrate is disposed satisfy a relationship of T1
Public/Granted literature
- US20150225846A1 ZnO FILM PRODUCTION DEVICE, AND PRODUCTION METHOD Public/Granted day:2015-08-13
Information query
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