Invention Grant
- Patent Title: Method for growing a bulk single crystal nitride material
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Application No.: US14647835Application Date: 2014-07-09
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Publication No.: US09611564B2Publication Date: 2017-04-04
- Inventor: Nanliu Liu , Zhiwen Liang , Jiao Chen , Guoyi Zhang
- Applicant: DONGGUAN INSTITUTE OF OPTO-ELECTRONICS PEKING UNIVERSITY
- Agency: Global IP Services, PLLC
- Agent Prakash Nama
- Priority: CN201310498099 20131022
- International Application: PCT/CN2014/081877 WO 20140709
- International Announcement: WO2015/058559 WO 20150430
- Main IPC: C30B19/10
- IPC: C30B19/10 ; C30B7/10 ; C30B19/06 ; C30B9/12 ; C30B19/02 ; C30B29/40

Abstract:
An apparatus and method for growing nitride bulk single crystal, including an autoclave having a pre-growth zone and a growth zone. With control of the concentration of a saturated solution in a pre-growth chamber, the oversaturation reaction conditions for the overall process of growth of the nitride bulk single crystal can be regulated. By regulating the liquid level difference of the melt on an upper surface of a seed crystal, nucleation growth of N/Ga is preferentially performed on the surface of the seed crystal, which suppresses polycrystal formation at a gas-liquid interface and improves the growth rate of crystal and the utilization rate of raw materials.
Public/Granted literature
- US20150292108A1 AN APPARATUS AND METHOD FOR GROWING A BULK SINGLE CRYSTAL NITRIDE MATERIAL Public/Granted day:2015-10-15
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