Invention Grant
- Patent Title: Method for manufacturing single-crystal silicon
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Application No.: US14362360Application Date: 2012-05-15
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Publication No.: US09611566B2Publication Date: 2017-04-04
- Inventor: Hideo Kato , Shinichi Kyufu , Masamichi Ohkubo
- Applicant: Hideo Kato , Shinichi Kyufu , Masamichi Ohkubo
- Applicant Address: DE Munich
- Assignee: Siltronic AG
- Current Assignee: Siltronic AG
- Current Assignee Address: DE Munich
- Agency: Brooks Kushman P.C.
- Priority: JP2011-283331 20111226
- International Application: PCT/EP2012/059017 WO 20120515
- International Announcement: WO2013/097951 WO 20130704
- Main IPC: C30B15/02
- IPC: C30B15/02 ; C30B15/00 ; C30B15/10 ; C30B29/06 ; C30B35/00 ; C30B30/04

Abstract:
Single crystal silicon ingots are grown by the multi-pulling method in a single crucible with minimization of dislocations by incorporating barium as a quartz crystallization inhibitor in amounts proportional to the diameter of the Czochralski crucible in which the crystal is grown. In at least one of the crystal pulling steps, a magnetic field is applied.
Public/Granted literature
- US20140326173A1 METHOD FOR MANUFACTURING SINGLE-CRYSTAL SILICON Public/Granted day:2014-11-06
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