Invention Grant
- Patent Title: Method for processing a carrier, a carrier, an electronic device and a lithographic mask
-
Application No.: US14693900Application Date: 2015-04-23
-
Publication No.: US09613812B2Publication Date: 2017-04-04
- Inventor: Jens Schneider , Henning Feick , Marcel Heller , Dieter Kaiser
- Applicant: Infineon Technologies AG
- Applicant Address: DE Neubiberg
- Assignee: INFINEON TECHNOLOGIES AG
- Current Assignee: INFINEON TECHNOLOGIES AG
- Current Assignee Address: DE Neubiberg
- Agency: Viering, Jentschura & Partner mbB
- Main IPC: H01L21/266
- IPC: H01L21/266 ; G03F1/00 ; G03F7/20 ; H01L29/36 ; G01L1/22 ; H01L21/027 ; H01L21/265 ; H01L43/06 ; H01L43/14 ; H01L29/78 ; H01L29/08 ; H01L27/02 ; G03F1/38 ; C23C14/04 ; C23C14/48 ; H01L29/861 ; G03F1/56
Abstract:
Various embodiments provide a method for processing a carrier, the method including changing the three-dimensional structure of a mask layer arranged over the carrier so that at least two mask layer regions are formed having different mask layer thicknesses; and applying an ion implantation process to the at least two mask layer regions to form at least two implanted regions in the carrier having different implantation depth profiles.
Public/Granted literature
- US20150287599A1 METHOD FOR PROCESSING A CARRIER, A CARRIER, AN ELECTRONIC DEVICE AND A LITHOGRAPHIC MASK Public/Granted day:2015-10-08
Information query
IPC分类:
