Invention Grant
- Patent Title: Electronic device and method for fabricating the same
-
Application No.: US14981727Application Date: 2015-12-28
-
Publication No.: US09614008B2Publication Date: 2017-04-04
- Inventor: Kwan-Woo Do , Ki-Seon Park
- Applicant: SK hynix Inc.
- Applicant Address: KR Icheon-Si
- Assignee: SK hynix Inc.
- Current Assignee: SK hynix Inc.
- Current Assignee Address: KR Icheon-Si
- Agency: Perkins Coie LLP
- Priority: KR10-2014-0023998 20140228
- Main IPC: H01L27/115
- IPC: H01L27/115 ; H01L27/24 ; H01L27/22 ; H01L43/08 ; H01L45/00 ; H01L43/02 ; G11C13/00 ; H01L27/105

Abstract:
An electronic device includes a semiconductor memory that includes: an inter-layer dielectric layer which is formed over a substrate; a contact plug which is coupled with the substrate by passing through the inter-layer dielectric layer and has a protruding portion over the inter-layer dielectric layer; a first variable resistance pattern which is formed over the contact plug; and a protective layer which covers the first variable resistance pattern and a portion of sidewalls of the contact plug in such a manner that the sidewalls of the contact plug are exposed.
Public/Granted literature
- US20160111472A1 ELECTRONIC DEVICE AND METHOD FOR FABRICATING THE SAME Public/Granted day:2016-04-21
Information query
IPC分类: