Invention Grant
- Patent Title: Methods for forming a high-voltage super junction by trench and epitaxial doping
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Application No.: US14806854Application Date: 2015-07-23
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Publication No.: US09614031B2Publication Date: 2017-04-04
- Inventor: Tai-I Yang , Shou-Wei Lee , Shao-Chi Yu , Hong-Seng Shue , Kun-Ming Huang , Po-Tao Chu
- Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
- Applicant Address: TW Hsin-Chu
- Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee Address: TW Hsin-Chu
- Agency: Eschweiler & Potashnik, LLC
- Main IPC: H01L21/761
- IPC: H01L21/761 ; H01L21/762 ; H01L21/308 ; H01L21/225 ; H01L29/06 ; H01L29/66 ; H01L29/78 ; H01L21/324 ; H01L29/10

Abstract:
A high-voltage super junction device is disclosed. The device includes a semiconductor substrate region having a first conductivity type and having neighboring trenches disposed therein. The neighboring trenches each have trench sidewalls and a trench bottom surface. A region having a second conductivity type is disposed in or adjacent to a trench and meets the semiconductor substrate region at a p-n junction. A gate electrode is formed on the semiconductor substrate region and is electrically isolated from the semiconductor substrate region by a gate dielectric. A body region having the second conductivity type is disposed on opposite sides of the gate electrode near a surface of the semiconductor substrate. A source region having the first conductivity type is disposed within in the body region on opposite sides of the gate electrode near the surface of the semiconductor substrate.
Public/Granted literature
- US20150325642A1 HIGH-VOLTAGE SUPER JUNCTION BY TRENCH AND EPITAXIAL DOPING Public/Granted day:2015-11-12
Information query
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