Invention Grant
- Patent Title: Multilayer electronic support structure with integral constructional elements
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Application No.: US13555437Application Date: 2012-07-23
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Publication No.: US09615447B2Publication Date: 2017-04-04
- Inventor: Dror Hurwitz , Alex Huang
- Applicant: Dror Hurwitz , Alex Huang
- Applicant Address: CN Zhuhai
- Assignee: Zhuhai Advanced Chip Carriers & Electronic Substrate Solutions Technologies Co. Ltd.
- Current Assignee: Zhuhai Advanced Chip Carriers & Electronic Substrate Solutions Technologies Co. Ltd.
- Current Assignee Address: CN Zhuhai
- Agency: Wiggin and Dana LLP
- Agent Gregory S. Rosenblatt; Jonathan D. Hall
- Main IPC: H05K1/02
- IPC: H05K1/02 ; H01L23/498 ; H01L23/00 ; H05K1/11

Abstract:
A multilayer electronic support structure including at least one pair of adjacent feature layers extending in an X-Y plane that are separated by a via layer; said via layer comprising a dielectric material that is sandwiched between the two adjacent feature layers and at least one constructional element through the dielectric material spanning between said pair of adjacent feature layers in a Z direction perpendicular to the X-Y plane; wherein said at least one constructional element is characterized by having a long dimension in the X-Y plane that is at least 3 times as long as a short dimension in the X-Y plane and wherein the at least one constructional element is fully encapsulated within the dielectric material and is electrically isolated from its surrounding.
Public/Granted literature
- US20140020945A1 Multilayer Electronic Support Structure with Integral Constructional Elements Public/Granted day:2014-01-23
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