Invention Grant
- Patent Title: Method for producing cyclohexasilane
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Application No.: US14138764Application Date: 2013-12-23
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Publication No.: US09617161B2Publication Date: 2017-04-11
- Inventor: Shin-ya Imoto , Takashi Abe , Morihiro Kitamura , Hikaru Takahashi , Takehiko Morita , Tatsuhiko Akiyama
- Applicant: Nippon Shokubai Co., Ltd.
- Applicant Address: JP Osaka
- Assignee: NIPPON SHOKUBAI CO., LTD.
- Current Assignee: NIPPON SHOKUBAI CO., LTD.
- Current Assignee Address: JP Osaka
- Agency: Wenderoth, Lind & Ponack, L.L.P.
- Priority: JP2012-281489 20121225; JP2013-185100 20130906
- Main IPC: C01B33/04
- IPC: C01B33/04 ; B01D53/46 ; B01D53/86 ; B01D53/72 ; B01D53/82

Abstract:
High purity cyclohexasilane and a method for increasing the purification efficiency thereto are provided. The method for producing cyclohexasilane of the present invention is characterized in that, in distilling crude cyclohexasilane to obtain purified cyclohexasilane, the absolute pressure during distillation is set to 2 kPa or less, and the heating temperature of crude cyclohexasilane is set to 25 to 100° C. The cyclohexasilane of the present invention contains pure cyclohexasilane at a rate of 98% by mass or more and 100% by mass or less.
Public/Granted literature
- US20140219893A1 CYCLOHEXASILANE AND METHOD FOR PRODUCING THE SAME Public/Granted day:2014-08-07
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