Invention Grant
- Patent Title: Polishing composition and method utilizing abrasive particles treated with an aminosilane
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Application No.: US14657594Application Date: 2015-03-13
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Publication No.: US09617450B2Publication Date: 2017-04-11
- Inventor: Steven Grumbine , Shoutian Li , William Ward , Pankaj Singh , Jeffrey Dysard
- Applicant: Cabot Microelectronics Corporation
- Applicant Address: US IL Aurora
- Assignee: Cabot Microelectronics Corporation
- Current Assignee: Cabot Microelectronics Corporation
- Current Assignee Address: US IL Aurora
- Agent Thomas Omholt
- Main IPC: C09G1/02
- IPC: C09G1/02 ; B24B37/04 ; C09K3/14 ; H01L21/3105
Abstract:
The inventive method comprises chemically-mechanically polishing a substrate with an inventive polishing composition comprising a liquid carrier and abrasive particles that have been treated with a compound.
Public/Granted literature
- US20150184029A1 POLISHING COMPOSITION AND METHOD UTILIZING ABRASIVE PARTICLES TREATED WITH AN AMINOSILANE Public/Granted day:2015-07-02
Information query
