Invention Grant
- Patent Title: Apparatus and method for fast evaluation of electroplating formulation performance in microvia filling
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Application No.: US14105154Application Date: 2013-12-12
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Publication No.: US09617653B2Publication Date: 2017-04-11
- Inventor: Yaofeng Sun , Minghui Gao , Shu Kin Yau , Min Gao
- Applicant: Hong Kong Applied Science and Technology Research Institute Company Limited
- Applicant Address: CN Hong Kong Science Park, Shatin, New Territories, Hong Kong
- Assignee: Hong Kong Applied Science and Technology Research Institute Company Limited
- Current Assignee: Hong Kong Applied Science and Technology Research Institute Company Limited
- Current Assignee Address: CN Hong Kong Science Park, Shatin, New Territories, Hong Kong
- Agency: Spruson & Ferguson (Hong Kong) Limited
- Main IPC: C25D17/12
- IPC: C25D17/12 ; C25D21/12 ; G01N27/403 ; C25D5/18

Abstract:
The presently claimed invention provides an electrochemical analytical apparatus and a method for evaluating performance of electroplating formulations of electrolyte solutions used for via filling. The electrochemical analytical apparatus comprises an electric power generating device, an electrical output signal measurement device, an electrochemical measurement device, and a motion generator. The electrochemical measurement device of the present invention comprises a supporting structure, a cavity, a cavity electrode, and a surface electrode. The electrical output signals of the cavity electrode and the surface electrode are measured during electroplating for calculating a filling performance value. The presently claimed invention provides an accurate, fast and cost effective method for evaluating performance of electroplating formulations, following with choosing the electroplating formulation of the highest FP value for actual microvia filling process.
Public/Granted literature
- US20150167195A1 Apparatus and Method for Fast Evaluation of Electroplating Formulation Performance in Microvia Filling Public/Granted day:2015-06-18
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