Invention Grant
- Patent Title: Substrate processing apparatus and method for detecting an abnormality of an ozone gas concentration
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Application No.: US14565747Application Date: 2014-12-10
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Publication No.: US09618493B2Publication Date: 2017-04-11
- Inventor: Masaki Kondo
- Applicant: Tokyo Electron Limited
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Agency: IPUSA, PLLC
- Priority: JP2013-261673 20131218
- Main IPC: G01N33/00
- IPC: G01N33/00

Abstract:
A substrate processing apparatus is provided that includes an ozonizer for generating ozone gas and an ozone sensor for detecting an ozone gas concentration. The substrate processing apparatus processes a substrate by using the ozone gas supplied from the ozonizer. The substrate processing apparatus includes a monitor unit for monitoring the ozone gas concentration detected by the ozone sensor and a control unit for detecting an abnormality of the ozone gas concentration based on the monitored ozone gas concentration and the monitored discharge power.
Public/Granted literature
- US20150168363A1 SUBSTRATE PROCESSING APPARATUS AND METHOD FOR DETECTING AN ABNORMALITY OF AN OZONE GAS CONCENTRATION Public/Granted day:2015-06-18
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