Invention Grant
- Patent Title: Method for producing spacer in liquid crystal panel and liquid crystal panel obtained thereby
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Application No.: US14241786Application Date: 2014-01-17
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Publication No.: US09618800B2Publication Date: 2017-04-11
- Inventor: Sikun Hao , Yuzhi Wu
- Applicant: SHENZHEN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD.
- Applicant Address: CN Shenzhen
- Assignee: SHENZHEN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD.
- Current Assignee: SHENZHEN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD.
- Current Assignee Address: CN Shenzhen
- Agency: Stein IP, LLC
- Priority: CN201310348182 20130809
- International Application: PCT/CN2014/070751 WO 20140117
- International Announcement: WO2015/018186 WO 20150212
- Main IPC: G02F1/1339
- IPC: G02F1/1339 ; G02F1/1343 ; H01L27/12

Abstract:
The present disclosure provides a method for producing spacers in a liquid crystal panel, comprising: (a) exposing a material layer adjacent to a side of a thin film transistor substrate of said liquid crystal panel by a mask with a pre-set pattern, in order to form a groove in said material layer, wherein the exposure energy of said exposure ranges from 10 to 100 mJ/cm2; (b) forming a main spacer and a side spacer in an opposite substrate, wherein the height of the side spacer is higher than that of the main spacer; and (c) assembling a TFT substrate and the opposite substrate together, such that the main spacer of the opposite substrate abuts against the TFT substrate, and the side spacer extends into said groove. The present disclosure also provides a liquid crystal panel obtained by said method.
Public/Granted literature
- US20150268501A1 METHOD FOR PRODUCING SPACER IN LIQUID CRYSTAL PANEL AND LIQUID CRYSTAL PANEL OBTAINED THEREBY Public/Granted day:2015-09-24
Information query
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