Invention Grant
- Patent Title: Reagent and composition of resist
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Application No.: US14891293Application Date: 2014-05-13
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Publication No.: US09618844B2Publication Date: 2017-04-11
- Inventor: Satoshi Enomoto
- Applicant: TOYO GOSEI CO., LTD.
- Applicant Address: JP Ichikawa-shi, Chiba JP Suita-shi, Osaka
- Assignee: Toyo Gosei Co., Ltd.,Osaka University
- Current Assignee: Toyo Gosei Co., Ltd.,Osaka University
- Current Assignee Address: JP Ichikawa-shi, Chiba JP Suita-shi, Osaka
- Agency: TraskBritt, P.C.
- International Application: PCT/JP2014/002531 WO 20140513
- International Announcement: WO2014/185065 WO 20141120
- Main IPC: B44C1/22
- IPC: B44C1/22 ; C03C15/00 ; C03C25/68 ; C23F1/00 ; G03F7/004 ; G03F7/039 ; G03F7/20 ; C07C33/24 ; C07C35/38 ; C07C35/40 ; C07C49/83 ; C07D219/06 ; C07D309/12 ; C07D311/86 ; C07D335/16 ; G03F7/16 ; G03F7/36
Abstract:
Described is a reagent that enhances acid generation of a photoacid generator and a composition containing such reagent.
Public/Granted literature
- US20160070165A1 REAGENT AND COMPOSITION OF RESIST Public/Granted day:2016-03-10
Information query
