Invention Grant
- Patent Title: Pattern forming method, pattern forming apparatus, and computer readable storage medium
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Application No.: US14389437Application Date: 2013-03-28
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Publication No.: US09618849B2Publication Date: 2017-04-11
- Inventor: Makoto Muramatsu , Takahiro Kitano , Tadatoshi Tomita , Keiji Tanouchi
- Applicant: Tokyo Electron Limited
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Agency: Posz Law Group, PLC
- Priority: JP2012-087106 20120406; JP2012-285132 20121227
- International Application: PCT/JP2013/059264 WO 20130328
- International Announcement: WO2013/150955 WO 20131010
- Main IPC: G03B27/32
- IPC: G03B27/32 ; G03B27/54 ; G03F7/40 ; H01L21/027 ; H01L21/033 ; H01L21/311 ; H01L21/67 ; B81C1/00 ; G03F7/20 ; G03F7/00
Abstract:
The present invention is a pattern forming method of forming a pattern on a substrate using a block copolymer, the pattern forming method including the steps of: forming a film of a block copolymer containing at least two kinds of polymers on the substrate; heating the film of the block copolymer; irradiating the heated film of the block copolymer with ultraviolet light in an atmosphere of an inert gas; and supplying an organic solvent to the film of the block copolymer irradiated with the ultraviolet light.
Public/Granted literature
- US20150062545A1 PATTERN FORMING METHOD, PATTERN FORMING APPARATUS, AND COMPUTER READABLE STORAGE MEDIUM Public/Granted day:2015-03-05
Information query
