Invention Grant
- Patent Title: Exposure method, exposure apparatus, and device manufacturing method
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Application No.: US15145561Application Date: 2016-05-03
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Publication No.: US09618854B2Publication Date: 2017-04-11
- Inventor: Kenichi Shiraishi , Ryuichi Hoshika , Tomoharu Fujiwara
- Applicant: NIKON CORPORATION
- Applicant Address: JP Tokyo
- Assignee: NIKON CORPORATION
- Current Assignee: NIKON CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Oliff PLC
- Priority: JP2005-127025 20050425; JP2005-283373 20050819
- Main IPC: G03B27/42
- IPC: G03B27/42 ; G03F7/20

Abstract:
A liquid immersion device that has an mixing mechanism that mixes and dissolves a predetermined substance for adjusting specific resistance of the liquid, which is supplied onto a liquid repellent film on the surface of an object (member) of a projection optical system placed on the light emitting side of projection optical system, and an liquid immersion area is formed by supplying the liquid in which the predetermined liquid is dissolved onto the liquid repellent film.
Public/Granted literature
- US20160246184A1 EXPOSURE METHOD, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD Public/Granted day:2016-08-25
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