Invention Grant
- Patent Title: Pattern of a capacitive touch device and manufacturing method thereof
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Application No.: US13541768Application Date: 2012-07-05
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Publication No.: US09619085B2Publication Date: 2017-04-11
- Inventor: Chi-Feng Wang , Ching-Shan Lin , Chien-Tai Chiu
- Applicant: Chi-Feng Wang , Ching-Shan Lin , Chien-Tai Chiu
- Applicant Address: CN Xiamen
- Assignee: TPK Touch Solutions (Xiamen) Inc.
- Current Assignee: TPK Touch Solutions (Xiamen) Inc.
- Current Assignee Address: CN Xiamen
- Agency: Cooper Legal Group LLC
- Priority: CN201110317542 20111014
- Main IPC: G06F3/041
- IPC: G06F3/041 ; G06F3/044

Abstract:
The present disclosure relates to a touch device, and more particularly to a pattern of a capacitive touch device and a manufacturing method thereof. The pattern of the capacitive touch device comprises of a substrate, two adjacent first axial electrodes, a first axial conductive wire, and a pair of metal jumpers. The first axial conductive wire is disposed between the two adjacent first axial electrodes for connecting the two adjacent first axial electrodes. The pair of metallic metal jumpers is disposed on the connecting points of the two first axial electrodes and the first axial conductive wire. Accordingly, resistance caused by the connecting points of the two adjacent first axial electrodes and the first axial conductive wire can be reduced such that response speed of the pattern of the capacitive touch control device is increased.
Public/Granted literature
- US20130093718A1 PATTERN OF A CAPACITIVE TOUCH DEVICE AND MANUFACTURING METHOD THEREOF Public/Granted day:2013-04-18
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