Invention Grant
- Patent Title: Composition for film formation, film, production method of patterned substrate, and compound
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Application No.: US14757551Application Date: 2015-12-24
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Publication No.: US09620378B1Publication Date: 2017-04-11
- Inventor: Shin-ya Nakafuji , Goji Wakamatsu , Tsubasa Abe , Kazunori Sakai
- Applicant: JSR Corporation
- Applicant Address: JP Tokyo
- Assignee: JSR CORPORATION
- Current Assignee: JSR CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Main IPC: G03F7/11
- IPC: G03F7/11 ; H01L21/308 ; H01L21/027 ; C09D7/12 ; C09D201/00 ; C09D171/08 ; C07C255/54 ; C09D171/12

Abstract:
A composition comprises: a compound having one partial structure represented by formula (1), and a solvent. n1 and n2 are each independently an integer of 0 to 2; and k1 and k2 are each independently an integer of 0 to 9. The compound preferably has an intermolecular bond-forming group. The compound is preferably represented by formula (2). Z represents the partial structure represented by the formula (1); Ar1 and Ar2 represent a substituted or unsubstituted arenediyl group having 6 to 20 carbon atoms; Ar3 and Ar4 represent a substituted or unsubstituted aryl group having 6 to 20 carbon atoms; and p1 and p2 are each independently an integer of 0 to 3.
Information query
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