Composition for film formation, film, production method of patterned substrate, and compound
Abstract:
A composition comprises: a compound having one partial structure represented by formula (1), and a solvent. n1 and n2 are each independently an integer of 0 to 2; and k1 and k2 are each independently an integer of 0 to 9. The compound preferably has an intermolecular bond-forming group. The compound is preferably represented by formula (2). Z represents the partial structure represented by the formula (1); Ar1 and Ar2 represent a substituted or unsubstituted arenediyl group having 6 to 20 carbon atoms; Ar3 and Ar4 represent a substituted or unsubstituted aryl group having 6 to 20 carbon atoms; and p1 and p2 are each independently an integer of 0 to 3.
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