Invention Grant
- Patent Title: Manufacturing method of transistor with floating gate and application method of transistor with floating gate electrode
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Application No.: US14368145Application Date: 2013-05-08
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Publication No.: US09620532B2Publication Date: 2017-04-11
- Inventor: Ning Chen , Wei Guo , Lu Wang
- Applicant: BOE TECHNOLOGY GROUP CO., LTD.
- Applicant Address: CN Beijing
- Assignee: BOE Technology Group Co., Ltd.
- Current Assignee: BOE Technology Group Co., Ltd.
- Current Assignee Address: CN Beijing
- Agency: Collard & Roe, P.C.
- Priority: CN201310108151 20130329
- International Application: PCT/CN2013/075310 WO 20130508
- International Announcement: WO2014/153810 WO 20141002
- Main IPC: H01L29/08
- IPC: H01L29/08 ; H01L29/04 ; H01L29/66 ; H01L29/78 ; H01L27/12 ; H01L21/28 ; H01L29/788 ; H01L29/423 ; H01L29/786 ; G02F1/133 ; G09G3/20 ; H01L21/02 ; H01L21/265 ; H01L21/311 ; H01L21/3213 ; H01L29/16 ; H01L29/417 ; H01L29/49 ; H01L29/51

Abstract:
Embodiments of the disclosure disclose a transistor with floating gate electrode, a manufacturing method thereof, an application method thereof and a display driving circuit. The transistor with floating gate electrode includes a substrate (1), and a floating gate electrode (3), a source electrode (4), a drain electrode (5) and a control gate electrode (6) disposed on the substrate (1). The transistor with floating gate electrode further comprises a first insulating film (7) and a polysilicon film (8) that are sequentially disposed on the substrate (1), and a channel region (2) is formed in the polysilicon film (8) at a position corresponding to the floating gate electrode (3).
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