Invention Grant
- Patent Title: CMOS image sensor structure with crosstalk improvement
-
Application No.: US15183595Application Date: 2016-06-15
-
Publication No.: US09620553B2Publication Date: 2017-04-11
- Inventor: Chien-Chang Huang , Hsing-Chih Lin , Chien-Nan Tu , Yu-Lung Yeh
- Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Applicant Address: TW Hsinchu
- Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Current Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Current Assignee Address: TW Hsinchu
- Agency: Maschoff Brennan
- Main IPC: H01L27/146
- IPC: H01L27/146

Abstract:
A semiconductor device includes a substrate, a semiconductor layer, light-sensing devices, a transparent dielectric layer and a grid shielding layer. The semiconductor layer overlies the substrate, and has a first surface and a second surface opposite to the first surface. The semiconductor layer includes microstructures disposed on the second surface of the semiconductor layer. The light-sensing devices are disposed on the first surface of the semiconductor layer. The transparent dielectric layer is disposed on the second surface of the semiconductor layer, and covers the microstructures. The grid shielding layer extends from the first surface of the semiconductor layer toward the second surface of the semiconductor layer, and surrounds each of the light-sensing devices to separate the light-sensing devices from each other, in which a depth of the grid shielding layer is greater than two-thirds of a thickness of the semiconductor layer.
Public/Granted literature
- US20160300877A1 CMOS IMAGE SENSOR STRUCTURE WITH CROSSTALK IMPROVEMENT Public/Granted day:2016-10-13
Information query
IPC分类: