Invention Grant
- Patent Title: Memory device, memory cell and memory cell layout
-
Application No.: US14500425Application Date: 2014-09-29
-
Publication No.: US09620594B2Publication Date: 2017-04-11
- Inventor: Shih-Hsien Chen , Liang-Tai Kuo , Hau-Yan Lu , Chun-Yao Ko
- Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
- Applicant Address: TW
- Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
- Current Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
- Current Assignee Address: TW
- Agency: Hauptman Ham, LLP
- Main IPC: H01L27/108
- IPC: H01L27/108 ; H01L29/10 ; H01L29/49 ; H01L27/02 ; H01L23/528 ; H01L27/11558 ; H01L29/66 ; H01L29/94

Abstract:
A memory device includes at least one memory cell. The memory cell includes first and second transistors, and first and second capacitors. The first transistor is coupled to a source line. The second transistor is coupled to the first transistor and a bit line. The first capacitor is coupled to a word line and the second transistor. The second capacitor is coupled to the second transistor and an erase gate.
Public/Granted literature
- US20160093628A1 MEMORY DEVICE, MEMORY CELL AND MEMORY CELL LAYOUT Public/Granted day:2016-03-31
Information query
IPC分类: