Invention Grant
- Patent Title: Electronic device including a channel layer including gallium nitride
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Application No.: US14741567Application Date: 2015-06-17
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Publication No.: US09620598B2Publication Date: 2017-04-11
- Inventor: Chun-Li Liu , Ali Salih
- Applicant: Semiconductor Components Industries, LLC
- Applicant Address: US AZ Phoenix
- Assignee: SEMICONDUCTOR COMPONENTS INDUSTRIES, LLC
- Current Assignee: SEMICONDUCTOR COMPONENTS INDUSTRIES, LLC
- Current Assignee Address: US AZ Phoenix
- Agency: Abel Law Group, LLP
- Main IPC: H01L29/15
- IPC: H01L29/15 ; H01L29/20 ; H01L29/786 ; H01L29/778 ; H01L29/10 ; H01L29/40 ; H01L29/423

Abstract:
An electronic device can transistor having a channel layer that includes a compound semiconductor material. In an embodiment, the channel layer overlies a semiconductor layer that includes a carrier barrier region and a carrier accumulation region. The charge barrier region can help to reduce the likelihood that de-trapped carriers from the channel layer will enter the charge barrier region, and the charge accumulation region can help to repel carriers in the channel layer away from the charge barrier layer. In another embodiment, a barrier layer overlies the channel layer. Embodiments described herein may help to produce lower dynamic on-resistance, lower leakage current, another beneficial effect, or any combination thereof.
Public/Granted literature
- US20160043181A1 ELECTRONIC DEVICE INCLUDING A CHANNEL LAYER INCLUDING A COMPOUND SEMICONDUCTOR MATERIAL Public/Granted day:2016-02-11
Information query
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