Invention Grant
- Patent Title: Power semiconductor device
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Application No.: US13846624Application Date: 2013-03-18
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Publication No.: US09620631B2Publication Date: 2017-04-11
- Inventor: Tomoko Matsudai , Tsuneo Ogura , Yuichi Oshino , Hideaki Ninomiya , Kazutoshi Nakamura
- Applicant: KABUSHIKI KAISHA TOSHIBA
- Applicant Address: JP Tokyo
- Assignee: KABUSHIKI KAISHA TOSHIBA
- Current Assignee: KABUSHIKI KAISHA TOSHIBA
- Current Assignee Address: JP Tokyo
- Agency: Holtz, Holtz & Volek PC
- Priority: JP2012-200858 20120912
- Main IPC: H01L29/739
- IPC: H01L29/739 ; H01L29/66 ; H01L29/02 ; H01L29/78 ; H01L29/40 ; H01L29/47 ; H01L29/08 ; H01L29/868 ; H01L29/06 ; H01L29/36

Abstract:
A power semiconductor device includes a first semiconductor layer of a first conductivity type, a second semiconductor layer of a second conductivity type, a pair of conductive bodies, a third semiconductor layer of the second conductivity type, and a fourth semiconductor layer of the first conductivity type. The second semiconductor layer is provided on the first semiconductor layer on the first surface side. The pair of conductive bodies are provided via an insulating film in a pair of first trenches extending across the second semiconductor layer from a surface of the second semiconductor layer to the first semiconductor layer. The third semiconductor layer is selectively formed on the surface of the second semiconductor layer between the pair of conductive bodies and has a higher second conductivity type impurity concentration in a surface of the third semiconductor layer than the second semiconductor layer.
Public/Granted literature
- US20140070266A1 POWER SEMICONDUCTOR DEVICE Public/Granted day:2014-03-13
Information query
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